| 摘要 |
PROBLEM TO BE SOLVED: To prevent insufficient exposure light or duplicated exposure near the boundary of an exposure region when the light irradiating a mask is partly cut to restrict the exposure area in the exposure of a substrate by using a proximity method. SOLUTION: Planar shutters 10, 20 are disposed apart from a mask 4 while strip shutters 30a, 30b, 40a, 40b are disposed near the mask 4. When an exposure region is to be restricted, the planar shutters 10, 20 and the strip shutters 30a, 30b, 40a, 40b are moved to specified positions along XY directions so that the planar shutters 10, 20 cut most of the light irradiating a region out of the exposure region of the mask 4, and the strip shutters 30b, 40b cut the light irradiating near the boundary of the exposure region of the mask 4. The light passing over the ends of the planar shutters 10, 20 and spread by diffraction is cut by the strip shutters 30a, 30b, 40a, 40b. COPYRIGHT: (C)2005,JPO&NCIPI
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