| 发明名称 |
COMPOSITIONS AND METHODS FOR CHEMICAL MECHANICAL POLISHING SILICA AND SILICON NITRIDE |
| 摘要 |
<p>The present invention provides an aqueous composition useful for polishing silica and silicon nitride on a semiconductor wafer comprising by weight percent 0.001 to 1 phthalic acid and salts thereof, 0.001 to 1 quaternary ammonium compound, 0.01 to 5 carboxylic acid polymer, 0.01 to 5 abrasive and balance water.</p> |
| 申请公布号 |
KR20050050584(A) |
申请公布日期 |
2005.05.31 |
| 申请号 |
KR20040097318 |
申请日期 |
2004.11.25 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
MUELLER BRIAN L.;XU HAOFENG |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/3105;(IPC1-7):C09K3/14 |
主分类号 |
B24B37/00 |
| 代理机构 |
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