| 摘要 |
Processes are disclosed which facilitate improved high-density memory circuitry, most preferably dynamic random access memory (DRAM) circuitry. Considerably greater numbers of die sites per wafer are achieved for 6-inch, 8-inch and 12-inch wafers for 4M, 16M, 64M and 256M integration levels. Further, an integrated circuit includes a semiconductor die, a plurality of functional and operably addressable memory cells arranged in at least one array formed on the semiconductor die, and circuitry formed on the semiconductor die and coupled to the memory cells for permitting data to be written to and read from the memory cells, wherein at least one area of 100 square microns of continuous surface area of the die has at least 170 of the memory cells.
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