METHOD OF FORMING A SEMICONDUCTOR DEVICE WITH A SUBSTANTIALLY UNIFORM DENSITY LOW-K DIELECTRIC LAYER,申请号SG20030005635-传众专利搜索

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发明名称	METHOD OF FORMING A SEMICONDUCTOR DEVICE WITH A SUBSTANTIALLY UNIFORM DENSITY LOW-K DIELECTRIC LAYER
摘要
申请公布号	SG111148(A1)	申请公布日期	2005.05.30
申请号	SG20030005635	申请日期	2003.09.17
申请人	TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD	发明人	LIH-PING LI;HSIN-HSIEN LU;SYUN-MING JANG
分类号	H01L21/768;(IPC1-7):H01L21/469	主分类号	H01L21/768
代理机构		代理人
主权项
地址

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