| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for EUV light projection exposing, in which a vibration for giving an adverse influence to an exposure performance can be reduced or an optical system, a stage, etc. in the apparatus is modularized to facilitate assembling of an entirety, and a configuration can be made compact, etc. SOLUTION: In the apparatus for the EUV light projection aligner 10, stage units 41, 43 (stage unit 40), loaders 51, 53 (loader unit 50) accompanied by occurrence of oscillating at a movable time and an illumination optical system chamber 21 which does not generate a vibration even at the movable time, and a projection optical system lens barrel 31, are separated. The vibrations are removed at the stage units 41, 43, the loaders 51, 53 by a vibration removing base 45, and the vibrations are removed at the lighting optical system 21 and the projection optical system 31 by vibration removing bases 15, 35. For that, the vibration from a building floor F, the vibration accompanied by the movableness of the stage units 41, 43, the loaders 51, 53 are hardly transmitted to both the optical systems 21, 31. And, a deterioration of the exposure performance due to the influence of the vibration can be reduced. COPYRIGHT: (C)2005,JPO&NCIPI
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