| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask which can prevent a non-device pattern such as a product identification pattern formed in a non-transfer region in a peripheral area of a photomask from being imaged onto an objective transfer face. <P>SOLUTION: A photomask 1 has a device pattern 7 consisting of a light shielding film pattern formed in a transfer region 2 on the surface of a light transmitting substrate 6. The photomask 1 further has a non-device pattern such as a product identification pattern 8 consisting of a light shielding film pattern in a non-transfer region 3 in the peripheral area. The photomask is also provided with a transmission reducing thin film 9 on the back face of the light transmitting substrate 6 and at a position opposing to at least the position where the non-device pattern is formed, the thin film 9 serving as a transmission reducing means to reduce transmission of the exposure light entering from the peripheral part of the back face of the substrate 6. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
