HIGH MOLECULAR COMPOUND AND POSITIVE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a positive resist material having high resolution with sensitivity in the case exposed by high energy rays and little line edge roughness owing to suppression of swelling during development and leaving little residue after the development.

SOLUTION: The high molecular compound has at least a repeating unit expressed by following general formula (1a) and a repeating unit expressed by following general formula (1b) and/or a repeating unit expressed by following general formula (1c). The positive resist material is produced by blending the high molecular compound as a base resin.

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