发明名称 |
ELECTRODE SUBSTRATE AND ITS MANUFACTURING METHOD, AND CHARGED BEAM EXPOSURE DEVICE USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To realize stable electric contact and to make a charge-up to hardly occur in an exposure device for performing pattern drawing by using a plurality of charged beams. SOLUTION: The electrode substrate includes a substrate 110 having a through hole 120, the electrode 130 installed on the side wall of the through hole, and wiring 140 for applying a voltage to the electrode. The wiring is brought into contact with the back surface 130b of a surface opposed to the through hole of the electrode. An insulator film 160 is provided on at least the part of a portion formed along the front surface of the substrate of the wiring. A conductor film 170 is provided on the insulator film, and this conductor film is electrically grounded. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005136114(A) |
申请公布日期 |
2005.05.26 |
申请号 |
JP20030369833 |
申请日期 |
2003.10.30 |
申请人 |
CANON INC;HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
OSANAGA KENICHI;ONO HARUTO;NAKAYAMA YOSHINORI |
分类号 |
H01J37/147;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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