发明名称 Parallel design processes for integrated circuits
摘要 In a parallel design process for ICs, plural circuit features to be evaluated are laid out while designing an IC. Plural ICs are then fabricated and packaged. For a first packaged IC, an interior circuit feature coupled to at least one of the plural circuit features to be evaluated is identified. A trimming point on the interior circuit feature is identified using an x-ray inspection system; coordinates of the trimming point are related to coordinates of a visible reference marker; and the relationship between the visible reference marker and the trimming point is used to position a cutting tool over the trimming point. The cutting tool is used to cut into the first packaged IC until the interior circuit feature has been acceptably modified at the trimming point. Operation of the first packaged IC is compared to operation of a second packaged IC. Other parallel design processes are also disclosed.
申请公布号 US2005114816(A1) 申请公布日期 2005.05.26
申请号 US20040018440 申请日期 2004.12.21
申请人 YEH ALBERT A.;PABILONIA REGINA N.;KRESSIN ROBERT W.;LIU WEI 发明人 YEH ALBERT A.;PABILONIA REGINA N.;KRESSIN ROBERT W.;LIU WEI
分类号 B23K26/00;H01L21/66;H01L23/525;H05K3/22;(IPC1-7):G06F17/50;G06F19/00 主分类号 B23K26/00
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