| 摘要 |
PROBLEM TO BE SOLVED: To repeatably and uniformly etch a surface of a sample without a large facility at a low cost. SOLUTION: In an electron spectroscopic analysis apparatus 1, the sample 4 is irradiated with X rays from a high-energy particle irradiating apparatus 6 in a vacuum chamber 2 under a vacuum ambience, an electron energy analyzer 7 detects kinetic energy of electrons emitted from the sample 4 by a photoelectric effect, and a composition and a chemical state are analyzed on the surface of the sample 4 or in depth. The surface of the sample 4 is irradiated with a fluorine ion beam from an ion gun 8 and ion-etched before the sample 4 is irradiated with high-energy particles. COPYRIGHT: (C)2005,JPO&NCIPI
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