| 摘要 |
<p>An exposure apparatus includes a projection optical system 3 for projecting a pattern on a mask 3 onto a substrate 5, a stage 13 for retaining and moving the substrate, and liquid film forming means (10, 11) for forming a liquid film 4 between a final surface of the projection optical system and the substrate, wherein L / V > fÑ is met where fÑ is a life of a gas bubble generated in the liquid film, V is a moving speed of the substrate, and L is a distance from an interface of the liquid film to an exposure area along a moving direction of the substrate.</p> |
