发明名称 Semiconductor device and method of manufacturing the same
摘要 The present invention provides a semiconductor device capable of suppressing an increase in electrical resistance of a narrow interconnect, while keeping reliability of a wide interconnect from being degraded. A semiconductor device comprises a plurality of interconnect layers, and an interconnect in at least one interconnect layer among the plurality of interconnect layers contains an impurity, and the wider the interconnect in the at least one interconnect layer is, the higher concentration of the impurity the interconnect contains.
申请公布号 US2005112866(A1) 申请公布日期 2005.05.26
申请号 US20040994479 申请日期 2004.11.23
申请人 NEC ELECTRONICS CORPORATION 发明人 TAKEWAKI TOSHIYUKI
分类号 H01L21/3205;H01L21/336;H01L21/768;H01L23/52;H01L23/528;H01L23/532;(IPC1-7):H01L21/336 主分类号 H01L21/3205
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