发明名称 Vacuum processing apparatus and semiconductor manufacturing line using the same
摘要 A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.
申请公布号 US6895685(B2) 申请公布日期 2005.05.24
申请号 US20030689035 申请日期 2003.10.21
申请人 HITACHI, LTD. 发明人 SORAOKA MINORU;YOSHIOKA KEN;KAWASAKI YOSHINAO
分类号 H01L21/302;B65G49/07;H01L21/00;H01L21/02;H01L21/203;H01L21/205;H01L21/3065;H01L21/677;(IPC1-7):F26B13/30 主分类号 H01L21/302
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