发明名称 GALLIUM-INDIUM-NITRIDE-ARSENIDE BASED EPITAXIAL WAFER AND HETERO-FIELD EFFECT TRANSISTOR USING THE SAME, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a hetero-field effect transistor which has improved electron mobility, thereby, realizing high speed operation, its manufacturing method, and a transceiver thereof. SOLUTION: The hetero-field effect transistor includes: an INP substrate 21; a channel layer 23 formed on the INP substrate via a buffer layer 22; a spacer layer 25a including a semiconductor having a band gap larger than that of the channel layer and formed so as to provide a hetero junction with the channel layer; and a carrier supply layer 26 formed so as to neighbor to the spacer layer, wherein the channel layer includes a layer of a compound semiconductor which is represented in chemical formula of Ga<SB>x</SB>In<SB>1-x</SB>N<SB>y</SB>A<SB>1-y</SB>, where A is As or Sb, the composition x is between 0 and 0.2, and the composition y is between 0.03 and 0.10. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005129967(A) 申请公布日期 2005.05.19
申请号 JP20050013136 申请日期 2005.01.20
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OTSUKA NOBUYUKI;MIZUNO KOICHI;YOSHII SHIGEO;SUZUKI CHIYOUJITSURIYO
分类号 H01L21/205;H01L21/338;H01L29/778;H01L29/812;(IPC1-7):H01L21/338 主分类号 H01L21/205
代理机构 代理人
主权项
地址