Broadly speaking, an invention is provided for monitoring a plasma optical emission. More specifically, the present invention provides a method for monitoring the plasma optical emission through a variable aperture to detect an endpoint of a plasma etching process without interferences that could lead to false endpoint calls. The method includes collecting optical emission data from a plasma through an aperture defined by moveable members. The moveable members are capable of varying a configuration of the aperture. The method also includes holding the moveable members at a particular time to cause the aperture to maintain a fixed configuration. The method further includes detecting a specific perturbation in the plasma optical emission while holding the moveable members.
申请公布号
WO2005045890(A2)
申请公布日期
2005.05.19
申请号
WO2004US34840
申请日期
2004.10.20
申请人
LAM RESEARCH CORPORATION;MCMILLIN, BRIAN, K.;DASSAPA, FRANCOIS, CHANDRASEKAR