发明名称 |
METHOD FOR FORMING SOLDER BUMP STRUCTURE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a solder bump structure capable of simplifying a solder bump structure process by using a double-exposure method of a positive photoresist. <P>SOLUTION: The method for forming a solder bump structure includes a step for developing a photoresist by primary exposure and forming at least one or more first openings, a step for forming a metal layer at the first opening, a step for developing a photoresist by secondary exposure and forming at least one or more second openings, and a step for forming a solder layer at the second opening. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005129931(A) |
申请公布日期 |
2005.05.19 |
申请号 |
JP20040303571 |
申请日期 |
2004.10.18 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
MA KEUM-HEE;JEONG SE-YOUNG;CHO TOGEN;KIM GU-SUNG |
分类号 |
H01L21/60;H01L21/44;H01L23/485;H01L23/50 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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