发明名称 METHOD FOR FORMING SOLDER BUMP STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a solder bump structure capable of simplifying a solder bump structure process by using a double-exposure method of a positive photoresist. <P>SOLUTION: The method for forming a solder bump structure includes a step for developing a photoresist by primary exposure and forming at least one or more first openings, a step for forming a metal layer at the first opening, a step for developing a photoresist by secondary exposure and forming at least one or more second openings, and a step for forming a solder layer at the second opening. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005129931(A) 申请公布日期 2005.05.19
申请号 JP20040303571 申请日期 2004.10.18
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 MA KEUM-HEE;JEONG SE-YOUNG;CHO TOGEN;KIM GU-SUNG
分类号 H01L21/60;H01L21/44;H01L23/485;H01L23/50 主分类号 H01L21/60
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