CONTROLLING ELECTROMECHANICAL BEHAVIOR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE

摘要

In one embodiment, the invention provides a method for fabricating a microelectromechanical system device. The method comprises fabricating a first layer (14) comprising a film (14) having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer (14) by at least reducing charge build up thereon during activation of the microelectromechanical systems device.