发明名称 Correction of spacing violations between pure fill via areas in a multi-wide object class design layout
摘要 In a Pure Fill Via Area (PFVA) extraction design flow, the extracted PFVAs may violate the minimum via spacing rule with the existing vias and may also violate the minimum via spacing rule among themselves. Such extracted PFVA violations may be corrected in an automatable design flow not requiring user intervention by removing any portion of a PFVA falling within a minimum via spacing rule of an existing via, to form a DRC-clean PFVA relative to existing vias, and removing any portion of a DRC-clean PFVA falling within the minimum via spacing rule of another DRC-clean PFVA.
申请公布号 US6895568(B2) 申请公布日期 2005.05.17
申请号 US20020260814 申请日期 2002.09.30
申请人 SUN MICROSYSTEMS, INC. 发明人 LI MU-JING
分类号 G06F17/50;(IPC1-7):G06F17/50 主分类号 G06F17/50
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