发明名称 Method of forming substrate for fluid ejection device
摘要 A method of forming an opening through a substrate having a first side and a second side opposite the first side includes extending spaced etch stops into the substrate from the first side, etching into the substrate between the spaced etch stops, and etching into the substrate from the second side toward the first side to the spaced etch stops. Etching into the substrate between the spaced etch stops includes forming a first portion of the opening and etching into the substrate to the spaced etch stops includes forming a second portion of the opening.
申请公布号 US6893577(B2) 申请公布日期 2005.05.17
申请号 US20030374033 申请日期 2003.02.25
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 发明人 CHEN CHIEN-HUA;KRAMER KENNETH MICHAEL
分类号 B41J2/16;(IPC1-7):G01D15/00;G11B5/127 主分类号 B41J2/16
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