| 发明名称 |
Dual metal-alloy nitride gate electrodes |
| 摘要 |
An embodiment of the invention is a gate electrode 70 having a nitrided high work function metal alloy 170 and a low work function nitrided metal alloy 190 . Another embodiment of the invention is a method of manufacturing a gate electrode 70 that includes forming and then patterning and etching a layer of high work function nitrided metal alloy 170 , forming a layer of low work function nitrided metal alloy 190 , and then patterning and etching layers 170 and 190.
|
| 申请公布号 |
US6893924(B2) |
申请公布日期 |
2005.05.17 |
| 申请号 |
US20040869254 |
申请日期 |
2004.06.16 |
| 申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
VISOKAY MARK R. |
| 分类号 |
H01L21/28;H01L21/8238;H01L29/49;(IPC1-7):H01L21/823 |
主分类号 |
H01L21/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
