VACUUM TREATMENT APPARATUS FOR RECTANGULAR OR SQUARE FLAT SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a structure principle which further reduces an installation area, a chamber volume and an evacuation period, and further simplifies "handling" for substrates outside and inside of a vacuum chamber, but reduces the contamination onto the substrate particularly by exfoliating particles from a layered product; and an operation procedure therefor. SOLUTION: This vacuum treatment apparatus has a substrate holder 13, and a linkage 8 for connecting a lower region of the substrate holder with a drive mechanism 1. At least a swiveling support part in the lower part of the linkage 8 is arranged below a horizontal bisector M which divides a height H of a supporting plane of the substrate holder 13 into two. COPYRIGHT: (C)2005,JPO&NCIPI