发明名称 Nonvolatile semiconductor memory and a fabrication method thereof
摘要 A nonvolatile semiconductor memory includes: a device region and a device isolating region, which have a pattern with a striped form that extends in a first direction, and are alternately and sequentially disposed at a first pitch in a second direction that is perpendicular to the first direction; and a contact made of a first conductive material, which is connected to the device region and disposed at the first pitch in the second direction. On a cross section of the second direction, the bottom width of the contact is longer than the top width of the contact, and the bottom width is longer than the width of the device region.
申请公布号 US2005101081(A1) 申请公布日期 2005.05.12
申请号 US20040935269 申请日期 2004.09.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 GODA AKIRA;NITTA HIROYUKI
分类号 H01L23/522;G11C16/04;H01L21/768;H01L21/8238;H01L21/8247;H01L27/02;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/823 主分类号 H01L23/522
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