发明名称 IONIC PLASMA DEPOSITION APPARATUS
摘要 A process and apparatus(10) for depositing thin films onto the surface of a substrate(40) using cathodic arc deposition. The process and apparatus (10) include a cathode (14) of target material, disposed within a vacuum chamber(12), which is powered to generate an arc for vaporizing the target material into a plasma of particulate constituents. The plasma constituents are selected, controlled and directed toward the substrate by electromagnetic fields generated by at least a first anode, surrounding the cathode(14), and a second anode positioned adjacent the first anode. Additional anode structures and variable charged screens can also be used to provide further control of the plasma constituents. Use of the process and apparatus(10) to manufacture fuel cells of the type employing catalytic layers, conductive layers, and a polymeric proton exchange membrane is also disclosed.
申请公布号 KR20050044500(A) 申请公布日期 2005.05.12
申请号 KR20047007483 申请日期 2004.05.15
申请人 IONIC FUSION CORPORATION 发明人 PETERSEN, JOHN H.
分类号 B01J37/02;C23C14/24;C23C14/32;C23C14/56;H01J37/32;H01M8/02;(IPC1-7):C23C14/32 主分类号 B01J37/02
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