发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To conduct a burn-in without bringing a probe pin into contact with a solder ball in a semiconductor device with the solder ball. <P>SOLUTION: After columnar electrodes 9 and sealing films 10 are formed on a semiconductor substrate 1 in a wafer state, the probe pins 23 are brought into contact on the electrodes 10, and the burn-in is conducted. The solder balls are formed on the electrodes 10, and the semiconductor substrate 1 in the wafer state is diced. Consequently, the unnecessary deformation of the solder balls due to the contacts of the probe pins 23 can be prevented, and the burn-in can be conducted even when the heights of the solder balls are varied. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005123291(A) 申请公布日期 2005.05.12
申请号 JP20030354680 申请日期 2003.10.15
申请人 CASIO COMPUT CO LTD 发明人 WAKABAYASHI TAKESHI;MIHARA ICHIRO
分类号 H01L21/66;G01R31/28;H01L21/56;H01L23/12;H01L23/31;H01L23/485 主分类号 H01L21/66
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