RESIST FILM PROCESSING APPARATUS AND METHOD OF FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To prevent redeposition of material vaporized out of a processed substrate in heat-treating without changing the optimum temperature condition. SOLUTION: A resist film processing apparatus includes a resist forming means 105 for forming a chemically amplified resist film on the processed substrate. Exposure means 102 radiates energy beam on the chemical amplification type resist film to form an exposed region having a latent image pattern.Rotation correcting means ARM rotationally corrects the direction of the processed substrate. Heat-treating means 104 heats the chemically amplified resist film as flowing air in one direction along the processed substrate. Developing means 106 develops the chemically amplified resist film. COPYRIGHT: (C)2005,JPO&NCIPI