发明名称 SILICON COMPOUND, RAW MATERIAL FOR FORMING THIN FILM AND METHOD FOR PRODUCING THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a silicon compound which is suitable as a precursor for forming thin films, to provide a raw material which comprises the silicon compound and is useful for forming thin films, and to provide a method for producing a thin film from the raw material for forming the thin films. SOLUTION: This silicon compound is represented by general formula (I). In general formula (I), an alkanediyl group represented by A is a group represented by the general formula (II). COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005119982(A) 申请公布日期 2005.05.12
申请号 JP20030353871 申请日期 2003.10.14
申请人 ASAHI DENKA KOGYO KK 发明人 ONOZAWA KAZUHISA;SATO HIROKI;TANAKA SHINICHI
分类号 C07F7/04;C23C16/42;(IPC1-7):C07F7/04 主分类号 C07F7/04
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