发明名称 Apparatus and method for electron beam irradiation having improved dose uniformity ratio
摘要 The present invention is related to an apparatus and method for irradiating a product package, comprising a radiation source directing a radiation beam along a beam direction towards said product package, conveying means for transporting said product package past said radiation source along a transport path, and reflecting means located on at least one side of the plane formed by said beam direction and said transport path. By adjusting the distance and angle of the reflecting means to the conveyor and beam, and improved dose uniformity ratio is obtained.
申请公布号 US2005098740(A1) 申请公布日期 2005.05.12
申请号 US20040902394 申请日期 2004.07.28
申请人 ION BEAM APPLICATIONS S.A. 发明人 BOL JEAN L.;GREGOIRE OLIVIER;MARTIN FRANCIS;MULLIER BENOIT;STICHELBAUT FREDERIC
分类号 A61L2/08;B65B55/08;B65B55/16;(IPC1-7):G01N9/04 主分类号 A61L2/08
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