发明名称 |
Group III Nitride Crystal, Method of Its Manufacture, and Equipment for Manufacturing Group III Nitride Crystal |
摘要 |
Affords Group III nitride crystals whose crystal growth rate is extensive, methods of their manufacture, and equipment for manufacturing such Group III nitride crystals. The manufacturing methods include: a melt-formation step, within a reaction vessel ( 21 ), of forming around a seed crystal ( 2 ) a melt ( 1 ) containing at least a Group III element and a catalyst; and a crystal-growth step of supplying a nitrogen-containing substance ( 3 ) to the melt ( 1 ) to grow a Group III nitride crystal ( 4 ) onto the seed crystal ( 2 ); characterized in controlling temperature so that in the crystal-growth step, the temperature of the melt ( 1 ) lowers from the interface ( 13 ) between the melt ( 1 ) and the nitrogen-containing substance ( 3 ), through to the interface ( 12 ) between the melt ( 1 ) and the seed crystal ( 2 ) or to the interface ( 14 ) between the melt ( 1 ) and the Group III nitride crystal ( 4 ) having grown onto the seed crystal ( 2 ).
|
申请公布号 |
US2005098090(A1) |
申请公布日期 |
2005.05.12 |
申请号 |
US20040904249 |
申请日期 |
2004.11.01 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
HIROTA RYU;NAKAHATA SEIJI |
分类号 |
C30B29/38;C30B9/00;C30B9/12;C30B17/00;C30B29/40;(IPC1-7):C30B1/00;C30B11/00;C30B21/02;C30B28/06 |
主分类号 |
C30B29/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|