发明名称 MASK FOR FORMING THIN FILM PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a mask for forming a thin film pattern, which prevents the occurrence of a display failure in a liquid crystal display and provides uniform film characteristics, by inhibiting a substrate from being bruised, and preventing the peeling of a protective film and a white spot on a black matrix layer. SOLUTION: The mask for forming the thin film pattern has an opening in the part for forming the thin film pattern, is used for patternizing the thin film through the opening of the mask in a state of contacting the mask with the substrate, and does not make a resin film coated into a pattern form, in a range of 200μm or nearer to an edge of the mask opening on a contacting side of the mask with the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005120406(A) 申请公布日期 2005.05.12
申请号 JP20030354875 申请日期 2003.10.15
申请人 TORAY IND INC 发明人 OGAWA MASAYUKI;OKAMURA MASANORI;KOBAYASHI YASUSHI
分类号 G02F1/1343;C23C14/04;(IPC1-7):C23C14/04;G02F1/134 主分类号 G02F1/1343
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