| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching method by which a structure in a desired shape can be precisely formed and etching friendly to the environment can be realized during etching, for example, by reducing an amount of substances scattering from a substrate, a vibrator manufactured by using the etching method, and electronic equipment provided with such a vibrator. SOLUTION: The etching method is employed for working a first layer 103 into a prescribed shape by etching. The etching method has a process for forming a mask 11 provided with a mask 111 for patterning in a shape corresponding to the prescribed shape and a mask 112 for a dummy, which is separated from the mask 111 and arranged so as to make the width of a gap 110 at each part in an etching region almost equal, in an etching region of the first layer 102, a process for patterning the first layer 103 on the side opposite to a second layer 103 with first etching by using the mask 11, and a process for removing a dummy part 9 subjected to the patterning corresponding to the mask 112 for a dummy of the first layer 103. COPYRIGHT: (C)2005,JPO&NCIPI
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