发明名称 PLASMA TREATMENT APPARATUS, AND DC POTENTIAL MEASURING METHOD AND DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To propagate a high-frequency wave from a high-frequency power supply or positively measure an applied DC potential of a member with safety in a plasma treatment apparatus. <P>SOLUTION: A power supply rod 36 is electromagnetically shut off by a coaxial cylindrical conductor 72 which is connected to a ground potential between a matching unit 34 and a bottom plate 10a of a chamber 10. A surface electrometer 70 is mounted on the cylindrical conductor 72 at a proper distance from the power supply rod 36 in the radial direction. The surface electrometer 70 measures the electrostatic surface potential of the power supply rod 36 in a non-contact manner through a capacitance, and sends a surface potential detection signal including measurement value information on the surface potential to a control section 68. The control section 68 performs required signal processing or an operation on the basis of the surface potential detection signal from the surface electrometer 70 to obtain the measurement value of a DC potential on the power supply rod 36. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005123578(A) 申请公布日期 2005.05.12
申请号 JP20040231445 申请日期 2004.08.06
申请人 TOKYO ELECTRON LTD 发明人 MAEHASHI SATOSHI;HAYAMIZU TOSHIYASU;UMEHARA NAOYUKI
分类号 H05H1/00;H01J37/32;H01L21/3065;H01L21/66;H05H1/46 主分类号 H05H1/00
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