发明名称 |
APPARATUS AND METHOD FOR CONTROLLED APPLICATION OF REACTIVE VAPORS TO PRODUCE THIN FILMS AND COATINGS |
摘要 |
A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor from is metered into predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.
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申请公布号 |
KR20050044797(A) |
申请公布日期 |
2005.05.12 |
申请号 |
KR20057002110 |
申请日期 |
2005.02.04 |
申请人 |
APPLIED MICROSTRUCTURES, INC. |
发明人 |
KOBRIN, BORIS;CHINN, JEFFREY, D.;NOWAK, ROMUALD;YI, RICHARD, C. |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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地址 |
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