| 发明名称 |
ETCHING PASTES FOR SILICON SURFACES AND LAYERS |
| 摘要 |
<p>The invention relates to novel etching media in the form of etching pastes for etching selected areas or the entire area of silicon surfaces and layers, in addition to the use of said media.</p> |
| 申请公布号 |
KR20050043928(A) |
申请公布日期 |
2005.05.11 |
| 申请号 |
KR20057003663 |
申请日期 |
2003.08.08 |
| 申请人 |
MERCK PATENT GMBH |
发明人 |
KLEIN, SYLKE;KUEBELBECK, ARMIN;STOCKUM, WERNER |
| 分类号 |
C09K13/02;H01L21/306;(IPC1-7):C09K13/02 |
主分类号 |
C09K13/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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