发明名称 Method of selectively adjusting surface tension of soldermask material
摘要 A method of selectively adjusting surface tension of a soldermask material. Specifically, a method of selectively adjusting the surface tension of a soldermask material to promote adhesion of a molding compound in a ball grid array package while maintaining a low surface tension on the ball attach area to prevent bridging between the solder balls. Solder balls require a low surface tension soldermask to minimize bridging, while the molding compound requires a high surface tension to provide adequate adhesion to the surface of the soldermask. By exposing selected portions of the soldermask to an activation method, such as ultra-violet radiation, the surface tension of the soldermask can be varied such that different areas of the package exhibit different surface tensions.
申请公布号 US6889430(B2) 申请公布日期 2005.05.10
申请号 US20010020352 申请日期 2001.12.12
申请人 MICRON TECHNOLOGY, INC. 发明人 JIANG TONGBI;TANDY PARTRICK
分类号 H01L23/31;H01L23/495;(IPC1-7):H05K3/34 主分类号 H01L23/31
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