发明名称 |
Vertex based layout pattern (VEP): a method and apparatus for describing repetitive patterns in IC mask layout |
摘要 |
A method to describe a circuit pattern comprises identifying vertices and those edges of the circuit pattern that are not incident with any vertex contained within a region of interest within the circuit pattern. The region of interest includes a portion of a polygon that is less than the entire polygon. The vertices and edges of the circuit pattern are compared to a predetermined set of known vertices and edges. A match may be used to identify an acceptable circuit or a defective circuit.
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申请公布号 |
US6892367(B2) |
申请公布日期 |
2005.05.10 |
申请号 |
US20020186372 |
申请日期 |
2002.06.28 |
申请人 |
PDF SOLUTIONS, INC. |
发明人 |
PALUSINSKI MICHAL;NIEWCZAS MARIUSZ;MALY WOJCIECH;STROJWAS ANDREZEJ;WAAS THOMAS;EISENMANN HANS |
分类号 |
G06F17/50;(IPC1-7):G06F17/50;G06F9/45 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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