发明名称 Decontaminating substrate with surface metal oxide layer containing radioactive species comprises contacting surface with oxidizing medium containing cerium(IV) and then with reducing medium
摘要 <p>Decontaminating a substrate with a surface metal oxide layer containing radioactive species comprises contacting the surface with an oxidizing medium containing cerium(IV) at ambient temperature for a time no longer than the duration of the phase of fastest initial kinetics in the curve of erosion versus time, removing the oxidizing medium, contacting the surface with a reducing medium and optionally removing the reducing medium.</p>
申请公布号 FR2861890(A1) 申请公布日期 2005.05.06
申请号 FR20030012940 申请日期 2003.11.04
申请人 ONECTRA 发明人 ROTTNER BERNARD
分类号 G21F9/00;G21F9/28;(IPC1-7):G21F9/00 主分类号 G21F9/00
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