发明名称 MULTISTEP RELEASE METHOD FOR ELECTROCHEMICALLY FABRICATED STRUCTURES
摘要 Multilayer structures are electrochemically fabricated from at least one structural material (e.g. nickel ), that is configured to define a desired structure and which may be attached to a substrate, and from at least one sacrificial material (e.g. copper) that surrounds the desired structure. After structure formation, the sacrificial material is removed by a multi-stage etching operation. In some embodiments sacrificial material to be removed may be located within passages or the like on a substrate or within an add-on component. The multi-stage etching operations may be separated by intermediate post processing activities, they may be separated by cleaning operations, or barrier material removal operations, or the like. Barriers may be fixed in position by contact with structural material or with a substrate or they may be solely fixed in position by sacrificial material and are thus free to be removed after all retaining sacrificial material is etched.
申请公布号 WO03095709(A3) 申请公布日期 2005.05.06
申请号 WO2003US14663 申请日期 2003.05.07
申请人 MEMGEN CORPORATION 发明人 COHEN, ADAM, L.;LOCKARD, MICHAEL, S.;MCPHERSON, DALE, S.
分类号 B81B3/00;G01P15/08;G01P15/125;H01P1/202;H01P3/06;H01P5/18;H01P11/00;H05K3/46 主分类号 B81B3/00
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