发明名称 Precursor delivery system with rate control
摘要 A method and apparatus for a gas delivery system to deliver a precursor from a vessel to a process chamber via a process gas produced by flowing a first carrier gas into the vessel and combining with a second carrier gas flowing through a bypass around the vessel and a precursor monitoring apparatus disposed between the process chamber and the vessel. The precursor monitoring apparatus has a gas analyzer to generate a first signal indicative of a concentration of the precursor in the process gas or to a signal indicative of a flow rate of the process gas.
申请公布号 US2005095859(A1) 申请公布日期 2005.05.05
申请号 US20030700328 申请日期 2003.11.03
申请人 APPLIED MATERIALS, INC. 发明人 CHEN LING;KANG PHILLIP;GANGULI SESHADRI
分类号 C23C16/448;C23C16/52;H01L21/285;(IPC1-7):H01L21/302;H01L21/461 主分类号 C23C16/448
代理机构 代理人
主权项
地址