发明名称 |
Precursor delivery system with rate control |
摘要 |
A method and apparatus for a gas delivery system to deliver a precursor from a vessel to a process chamber via a process gas produced by flowing a first carrier gas into the vessel and combining with a second carrier gas flowing through a bypass around the vessel and a precursor monitoring apparatus disposed between the process chamber and the vessel. The precursor monitoring apparatus has a gas analyzer to generate a first signal indicative of a concentration of the precursor in the process gas or to a signal indicative of a flow rate of the process gas.
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申请公布号 |
US2005095859(A1) |
申请公布日期 |
2005.05.05 |
申请号 |
US20030700328 |
申请日期 |
2003.11.03 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHEN LING;KANG PHILLIP;GANGULI SESHADRI |
分类号 |
C23C16/448;C23C16/52;H01L21/285;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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