| 发明名称 |
SURFACE PLATE, STAGE DEVICE, EXPOSURE DEVICE, AND EXPOSURE METHOD |
| 摘要 |
<p>For example, to control an effect due to entrance and leakage of liquid for exposure and allow a preferable exposure processing, a support surface is provided which supports an object. The support surface is liquid repellant, and a collection device is provided which collects liquid from the support surface.</p> |
| 申请公布号 |
KR20050041973(A) |
申请公布日期 |
2005.05.04 |
| 申请号 |
KR20040087331 |
申请日期 |
2004.10.29 |
| 申请人 |
NIKON CORPORATION |
发明人 |
ARAI, DAI |
| 分类号 |
H01L21/027;G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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