发明名称 PLASMA PROCESSING DEVICE
摘要 In a microwave plasma processing apparatus, the reflection of microwave by the joint unit between the microwave supplying waveguide and the microwave antenna is reduced by providing a taper surface or a member having a medium permittivity between the microwave supplying'waveguide and the microwave antenna so as to moderate an impedance change. Accordingly, the efficiency of power supplying is improved, and reduced discharge ensures stable formation of plasma. <IMAGE>
申请公布号 KR100486673(B1) 申请公布日期 2005.05.03
申请号 KR20027016001 申请日期 2002.03.28
申请人 发明人
分类号 H01L21/02;H05H1/46;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/02 主分类号 H01L21/02
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