| 摘要 |
PROBLEM TO BE SOLVED: To provide a kiln capable of uniformly baking the whole matter to be baked by making, in the case of baking a flat plate-like matter to be baked such as a PDP glass substrate in a substantially vertically raised state, a temperature difference difficult to occur between the upper part and lower part of the matter to be baked, and solving the temperature unevenness, particularly, in the furnace lateral direction of the lower part. SOLUTION: The kiln for baking the matter 1 to be baked comprises a heating means 3 capable of performing a divisional temperature control in the furnace lateral direction, which is located under the matter 1 to be baked. The baking of the matter 1 to be baked is performed by the combination of radiation heating from the heating means 3 with convection heating by the furnace internal atmosphere heated by the heating means 3. COPYRIGHT: (C)2005,JPO&NCIPI
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