发明名称 |
METHOD AND APPARATUS FOR CHEMICAL MONITORING |
摘要 |
The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process. |
申请公布号 |
WO2005012855(A3) |
申请公布日期 |
2005.04.28 |
申请号 |
WO2004US23516 |
申请日期 |
2004.07.22 |
申请人 |
LIGHTWIND CORPORATION;POWELL, GARY;LITVAK, HERBERT, ELLIOT |
发明人 |
POWELL, GARY;LITVAK, HERBERT, ELLIOT |
分类号 |
G01J;G01J3/443;G01N21/00;G01N21/73 |
主分类号 |
G01J |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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