发明名称 An assembly, a lithographic apparatus, and a device manufacturing method
摘要 <p>A lithographic apparatus comprising a projection optics assembly PL for projecting a patterned beam onto a target portion of the substrate. The projection optics assembly comprising a first element 4 having a predetermined functionality which is to be fixedly positioned with respect to a second element 2, wherein the elements 4, 2 are arranged in a spaced relationship on a support frame 6, wherein the support frame 6 is provided with an interface surface 8 formed on or in said support frame 6 for receiving the first element 4, wherein the interface surface 8 determines the position of the first element 4 with respect to the second element 2, and is adapted in accordance with the predetermined functionality so that the first element 4 is positionable with respect to the second element 2 with at least three degrees of freedom.</p>
申请公布号 EP1526407(A2) 申请公布日期 2005.04.27
申请号 EP20040077856 申请日期 2004.10.15
申请人 ASML NETHERLANDS B.V. 发明人 FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS
分类号 G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
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