发明名称 |
An assembly, a lithographic apparatus, and a device manufacturing method |
摘要 |
<p>A lithographic apparatus comprising a projection optics assembly PL for projecting a patterned beam onto a target portion of the substrate. The projection optics assembly comprising a first element 4 having a predetermined functionality which is to be fixedly positioned with respect to a second element 2, wherein the elements 4, 2 are arranged in a spaced relationship on a support frame 6, wherein the support frame 6 is provided with an interface surface 8 formed on or in said support frame 6 for receiving the first element 4, wherein the interface surface 8 determines the position of the first element 4 with respect to the second element 2, and is adapted in accordance with the predetermined functionality so that the first element 4 is positionable with respect to the second element 2 with at least three degrees of freedom.</p> |
申请公布号 |
EP1526407(A2) |
申请公布日期 |
2005.04.27 |
申请号 |
EP20040077856 |
申请日期 |
2004.10.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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