发明名称 |
Method and system of lithography using masks having gray-tone features |
摘要 |
A method forms patterns on a substrate by exposing the substrate a first time and exposing the substrate a second time using a mask containing gray-tone features. The gray-tone features locally adjust an exposure dose in regions corresponding to features defined in the primary exposure. Moreover, the gray-tone features enable the forming of features having different critical dimensions on a substrate. The gray-tone features may be sub-resolution features and formed by pixellation. The trim mask containing gray-tone features may have regions with different transmissivities.
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申请公布号 |
US6884551(B2) |
申请公布日期 |
2005.04.26 |
申请号 |
US20020234783 |
申请日期 |
2002.09.04 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
FRITZE MICHAEL;TYRRELL BRIAN |
分类号 |
G03F1/00;G03F1/14;G03F7/00;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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