| 摘要 |
<P>PROBLEM TO BE SOLVED: To form an opening with comparatively small resolution limit and with narrow width and to provide excellent lightness and color purity, even in the case of a color filter for semi-transparent semi-reflective liquid crystal display device. <P>SOLUTION: The color filter for semi-transparent semi-reflective liquid crystal display is manufactured so that the opening with the minimum width of 13μm or less is formed in one pixel of the coloring layer by forming the opening in one pixel of a coloring layer by a photolithographic process after forming a negative type coloring sensitive material layer on a substrate, performing exposure by shifting relative positions of a mask for exposure and the substrate to which the negative type coloring sensitive material is applied and forming an area without exposure history in the pixel of the coloring layer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
