| 发明名称 |
METHOD OF FORMING READ SENSOR USING PHOTORESIST STRUCTURES WITHOUT UNDERCUT WHICH ARE REMOVED BY USING CHEMICAL-MCCHANICAL POLISHING (CMP) LIFT-OFF PROCESSES |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a read sensor for very narrow track width in a method for manufacturing a read sensor for magnetic head. SOLUTION: Height of a stripe is decided prior to track width by using a formed photoresist layer without undercut. COPYRIGHT: (C)2005,JPO&NCIPI
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| 申请公布号 |
JP2005108420(A) |
申请公布日期 |
2005.04.21 |
| 申请号 |
JP20040287730 |
申请日期 |
2004.09.30 |
| 申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS BV |
发明人 |
BAER AMANDA;CYRILLA MARIE-CLAIRE;DILL FREDERICK HAYES;WANG BENJAMIN LU CHEN;HWANG CHARNGYE;PINARBASI MUSTAFA |
| 分类号 |
G11B5/31;G11B5/39;H01L43/08;(IPC1-7):G11B5/39 |
主分类号 |
G11B5/31 |
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