发明名称 METHOD FOR ADJUSTING GAIN CONTROLLER OF DEFLECTOR IN CHARGED PARTICLE BEAM EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for efficiently adjusting a gain adjusting device of a deflector. SOLUTION: A wafer stage is moved, and the +x side edge of a molded opening image 2 is positioned at the center of a pin hall 1 (a). The wafer stage is driven from this status, and the position of the pin hall 1 is moved only by x<SB>1</SB>in an x axial direction (b). When the input value of a gain adjusting device is changed only by X=x<SB>1</SB>and Y=0, the molded opening image 2 is deflected at a position shown by the broken line of (c). Then, a gain A is adjusted so that the +x side edge of the molded opening image shown by the broken line of (c) can be positioned at the center of the pin hall (d). The value of this gain A is defined as an adjustment value. This adjustment is operated in the same way for the other gains. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005109328(A) 申请公布日期 2005.04.21
申请号 JP20030343181 申请日期 2003.10.01
申请人 NIKON CORP 发明人 KOJIMA SHINICHI
分类号 G03F7/20;G03F9/00;H01J37/147;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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