| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an aligner, a pellicle alternative, and a manufacturing method of a semiconductor device, for stably protecting the pattern of a photomask at a low cost with reliability. <P>SOLUTION: A wafer stage 18 on which a mask stage 14, a projection optical system 17, and a semiconductor wafer WF are placed is provided in a chamber 12 to which a lighting system 11 is provided. A detachable frame 15 along with a protective film 16 is provided to the mask stage 14. The protective film 16 comprises such material as at least transparent for illumination light without absorbing it. A photomask 13 required for exposure is transported into the chamber 12 from a stocker 20 by a transportation mechanism 19, and then set to the mask stage 14. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
