| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photoresist composition capable of attaining at least one, preferably all of the following objectives; prevention of the occurrence of haze and unevenness when the top of a highly reflective metal film is coated with a photoresist composition, improvement of uniformity of film thickness by preventing the occurrence of drop marks in a coating method by spinning after central dropping, improvement of uniformity of film thickness by preventing the occurrence of streaks in a discharge nozzle system coating method. <P>SOLUTION: The positive photoresist composition comprises (A) an alkali-soluble novolac resin, (C) a naphthoquinonediazido-containing compound, (D) an organic solvent and (E) a polyester modified polydialkylsiloxane surfactant including a specified repeating unit. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
