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发明名称
OVER-COATING COMPOSITION FOR PHOTORESIST AND PROCESS FOR FORMING PHOTORESIST PATTERN USING THE SAME
摘要
申请公布号
KR20050037237(A)
申请公布日期
2005.04.21
申请号
KR20030072690
申请日期
2003.10.17
申请人
HYNIX SEMICONDUCTOR INC.
发明人
JUNG, JAE CHANG
分类号
G03F7/11;(IPC1-7):G03F7/11
主分类号
G03F7/11
代理机构
代理人
主权项
地址
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